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Global Metal Sputtering Target Market Insights, Forecast to 2026

Published Date: 2020-08-07   |   Pages: 120   |   Tables: 176   | Report Id: 2061465   | Hits: 76 |   Electronics & Semiconductor

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Market Analysis and Insights: Global Metal Sputtering Target Market

In 2019, the global Metal Sputtering Target market size was US$ 3298.87 million and it is expected to reach US$ 4897.56million by the end of 2026, with a CAGR of 7.62% during 2020-2026.

Global Metal Sputtering Target Scope and Segment

Metal Sputtering Target market is segmented by company, region (country), by Type, and by Application. Players, stakeholders, and other participants in the global Metal Sputtering Target market will be able to gain the upper hand as they use the report as a powerful resource. The segmental analysis focuses on sales, revenue and forecast by region (country), by Type and by Application for the period 2015-2026.


By Company

Materion (Heraeus)

JX Nippon Mining & Metals Corporation

Praxair

Plansee SE

Hitachi Metals

Honeywell

Mitsui Mining & Smelting

Sumitomo Chemical

ULVAC

TOSOH

Ningbo Jiangfeng

Heesung

Luvata

Fujian Acetron New Materials Co., Ltd

Changzhou Sujing Electronic Material

Luoyang Sifon Electronic Materials

GRIKIN Advanced Material Co., Ltd.

FURAYA Metals Co., Ltd

Advantec

Angstrom Sciences

Umicore Thin Film Products

Segment by Type

Metal Target

Alloy Target

Segment by Application

Semiconductor

Solar Energy

Flat Panel Display

Others

By Region

North America

United States

Canada

Asia-Pacific

China

Japan

South Korea

Taiwan

Southeast Asia

Europe

Germany

France

U.K.

Italy

Russia

Latin America

Mexico

Brazil

Colombia

Argentina

Middle East & Africa

Middle East

Africa

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