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  • Market research on high-performance sputtering targets: the market size in 2021 will be 24.18 billion yuan

According to QYResearch 's market research report " 2022-2028 China's high-performance sputtering target market status research analysis and development prospect forecast report", this report provides a basic overview of the high-performance sputtering target market, including definition, classification, application and industry At the same time, it also discusses the development policy and plan, manufacturing process and cost structure, analyzes the development status and future market trends of the high-performance sputtering target market, and analyzes the high-performance sputtering target market from the perspectives of production and consumption The main production areas, main consumption areas and main producers.

The target material is the source material for sputtering thin film preparation, also known as sputtering target material, especially the high-performance sputtering target material used in the physical vapor deposition process of electronic components manufacturing, is the preparation of semiconductor wafers, display panels, solar cells, etc. Key materials for surface electronic thin films.

In terms of the industrial chain, the upstream of the high-performance sputtering target industry mainly focuses on metal purification, including raw materials and production equipment. Among them, the production cost of high-purity metal raw materials can account for 80% of the industry's production cost. Production equipment includes target cold rolling systems, More than 30 types of plasma spraying equipment, heat treatment furnace, etc.; downstream applications mainly include semiconductors, flat panel displays, solar cells, etc.

The upstream of the high-performance sputtering target industry is mainly metal purification, including raw materials and production equipment, among which the production cost of high-purity metal raw materials can account for 80% of the industry's production cost.

In recent years, under the background of national policy support and strong demand in downstream application fields, my country's high-performance sputtering target industry technology has made great breakthroughs, product performance has continued to improve, and the market has continued to expand. According to the data, in 2021, the market size of my country's high-performance sputtering target industry will be 24.18 billion yuan, a year-on-year increase of 20%.

At present, the downstream applications of my country's high-performance sputtering target industry mainly include semiconductors, flat panel displays, solar cells and other fields. According to the data, in 2021, in the downstream application structure of my country's high-performance sputtering target industry, the market share of flat panel display, semiconductor, and solar cells will be relatively large, accounting for 30%, 20%, and 18% respectively.

Where are the development prospects and investment opportunities of the industry market in the future? For more details about the industry, please click to view the report "2022-2028 China's High Performance Sputtering Target Market Status Research Analysis and Development Prospect Forecast Report". The QYResearch report conducts specific investigation, research, and analysis of various factors related to the industry to gain insight into the future development direction of the industry, the evolution trend of the industry's competitive landscape, technical standards, market size, potential problems, and crux of the industry's development, and evaluates the investment value of the industry, The degree of effect and benefit, put forward constructive suggestions, and provide reference for industry investment decision makers and business operators.

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