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Global Nanoimprint Lithography (NIL) Equipment Market: Market Driver and Restraint

Nanoimprint lithography is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.

Now, extreme UV lithography (EUV), 193 nm immersion lithography, mask less lithography (MLL) techniques and nanoimprint lithography (NIL) are considered as candidates for the so called Next Generation Lithography (NGL) at 32 nm and 22 nm nodes. In parallel, imprint technology has been promoted by a large scientific community and non-IC industry segments including high-density storage, optoelectronics, telecommunication as well as biochips or micro total analysis systems.

Global Nanoimprint Lithography (NIL) Equipment Market: Forecast by Application

Application segment consists of Consumer electronics, Optical equipment, and others. Optical equipment segment is estimated to account for a revenue/volume share of over 47.59% in 2017.

Global Nanoimprint Lithography (NIL) Equipment Market: Forecast by Region

China, North America, Europe, Japan, Rest of World are the five regions that are included in this report. Europe is the dominant market in the global Nanoimprint Lithography (NIL) Equipment market in terms of value/volume. The Europe Nanoimprint Lithography (NIL) Equipment market was estimated to be valued at 86 units in 2017. The North America market is expected to expand at a robust rate in terms of revenue over the forecast period due to the steadily increasing production capacity in this region.

Global Nanoimprint Lithography (NIL) Equipment Market: Key Players

Obducat, EV Group, Canon(Molecular Imprints), Nanonex, Suss MicroTec and GuangDuo Nano are the key vendors included in this report.

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